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Unit 6b 6th Flr. Citibank-Frabelle Building, Alaba, Muntinlupa, Philippines

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• Two High-Performance Taiyo Nippon Sanso HR4469G MOCVD Epitaxy Systems from Lumentum Japan

 

Two High-Performance Taiyo Nippon Sanso HR4469G MOCVD Epitaxy Systems from Lumentum Japan

 

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MOCVD Epitaxy System, Maker Taiyo Nippon Sanso, Model HR4469G, S/N 15Q188A-00, YoM 2023;

1. Overview
The HR4469G is a high-performance MOCVD system designed for epitaxial growth of III-V
compound semiconductors. It is equipped with a horizontal reactor for processing one
4-inch wafer under reduced pressure.
The system integrates gas supply, heating, vacuum exhaust, safety interlock, and
computer-based control systems.

2. Key Features
- Horizontal quartz reactor (HR4000 type)
- Automatic wafer transfer with glove box and pass box
- Comprehensive safety system compliant with High Pressure Gas Safety Act (Japan)
- Total system supply including gas handling, vacuum, and control technologies

3. System Configuration
Standard configuration includes raw material supply control systems (organometallic and
hydride gases), RF induction heating, vacuum exhaust systems, safety interlocks, and
PLC-based control systems.

4. Reactor / Glove Box
Water-cooled horizontal quartz reactor HR4000 for single 4-inch wafer processing. Reaction
temperature range: 450‒1000¢XC. Rotary graphite susceptor with SiC coating.
Automatic wafer loading/unloading via load-lock chamber with turbo molecular pumping
system.

5. Heating System
RF induction heating system (approx. 30 kW) with PID temperature control. Temperature
stability ¡Ó0.5¢XC.

6. Vacuum Exhaust System
Dry pump system for process exhaust and turbo molecular pump for high-vacuum
operations. Automatic pressure control via proportional control valves.

7. Safety System
Monitoring of toxic/flammable gas leakage, earthquake, abnormal pressure and
temperature. Automatic interlocks trigger safe shutdown, nitrogen purge, or heating stop
as required.

8. Measurement & Control
Touch panel (15-inch TFT), PLC, and dedicated PC for automatic recipe control (up to 200
steps). Data logging in CSV format.

 

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